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Can DSA become the next patterning solution extending the limits of 193nm and EUV lithography
February 10, 2012
By: DAVID SAVASTANO
Editor, Ink World Magazine
At the upcoming SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line all-under-one-roof in imec’s 300mm cleanroom fab. The upgrade of an academic lab-scale DSA process flow to a fab-compatible flow was realized in collaboration with the University of Wisconsin, AZ Electronic Materials and Tokyo Electron Ltd. Imec’s DSA collaboration aims to address the critical hurdl...
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